CN200580036281
CN101052921A
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摘要：本发明的目的在于提供一种以成本有效的方式得到具有在5-100NM范围内的周期的周期性和准周期性图形的系统和方法。当然,该系统对周期在该范围之外的图形也具有一般适用性。该目的通过本发明来实现,本发明公开了一种用于通过使用干涉光刻技术在样品上产生周期性和/或准周期性图形的系统,该系统包括:A)光子源;B)具有与所希望的图形相应的周期性或准周期性图形的掩模;所述掩模被设置在与光子源的第一距离处或被设置在例如瞄准仪、收集器、反射镜、透镜、滤光器和光阑的中间光学元件之后;C)用于保持样品的样品保持器在光子源的相对侧被设置在与掩模的第二距离处,由此该第二距离被选择成在这样的范围内,在该范围内强度分布基本上是固定的和距离不变的,或者第二距离被改变以便在样品表面上得到所希望的平均强度分布。
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Abstract： It is the aim of this invention to provide a system and a method to achieve periodic and quasi-periodic patterns with periods in the 5-100 nm range in a cost effective way. Of course, the system has also general applicability to patterns periods outside this range. This aim is achieved by the present invention which discloses a system for generating periodic and/or quasi-periodic pattern on a sample by using an interference lithography technique; the system comprising: a) a photon source; b) a mask having a periodic or quasi-periodic pattern that corresponds to the desired pattern; said mask being disposed at a first distance from the photon source or after intermediate optical elements such as collimators, collectors, mirrors, lenses, filters and apertures; c) a sample holder for holdingthe sample being disposed in a second distance from the mask on the side opposite to the photon source, thereby the second distance is chosen to be in a range where the intensity distribution is substantially stationary and distance-invariant or the second distance is varied to obtain a desired average intensity distribution on the sample surface.
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申请人： 保罗·谢勒学院
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Applicant： SCHERRER INST PAUL[CH]
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地址： 瑞士菲利根
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发明(设计)人： H·H·索拉克
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Inventor： SOLAK HARUN H[CH]
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主分类号： G03F7/20
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分类号： G03F7/20
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